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| OEM | OEM Services Provided |
| Feature | Good stability,Easy to Use |
| Classification | Catalysts and Additives |
| Advantage | Professional, Fast Delivery, Customizable | Samples | Apply for free，Contact us now. |
The main customers of 25% TMAH are the well-known TFT-LCD factories in Taiwan, and it is also the raw material of 2.38% developer used by semiconductor factories in Taiwan.
| Category | Details |
|---|---|
| Chemical Name | Tetramethyl Ammonium Hydroxide (TMAH) |
| Molecular Formula | C₄H₁₃NO |
| CAS Number | 75-59-2 |
| Appearance | Colorless to pale yellow liquid |
| Grade | Electronic Grade (High Purity ≥99.99%) |
| Property | Value |
|---|---|
| Concentration | 2.38–25% (Semiconductor Grade) |
| Density (25°C) | ~1.01 g/cm³ (2.38% solution) |
| pH (25% sol.) | ~13.5 (Strong base) |
| Boiling Point | Decomposes before boiling |
| Flash Point | Non-flammable |
| Application | Function |
|---|---|
| Semiconductor Lithography | Positive photoresist developer (for I-line, KrF, ArF) |
| LCD Manufacturing | Etchant for indium tin oxide (ITO) |
| Wafer Cleaning | Removes organic residues |
| Electroplating | Additive for copper deposition |
| Parameter | Typical Requirement |
|---|---|
| Purity | ≥99.99% (Metals <1 ppb) |
| Particle Count | <100 particles/mL (>0.2 µm) |
| Chloride (Cl⁻) | <10 ppb |
| Sodium (Na⁺) | <1 ppb |
| Parameter | Details |
|---|---|
| OSHA PEL | Not established (handle as corrosive) |
| Health Hazards | Severe skin/eye burns; neurotoxic at high exposure |
| Storage | Polyethylene bottles; avoid CO₂ absorption |
| First Aid | Immediate water flushing (15 min for skin/eyes) |
| Developer | TMAH vs. Alternatives |
|---|---|
| KOH | Higher metal contamination, less controllable |
| Tetraethyl Ammonium Hydroxide | More expensive, slower development |
| Sodium Hydroxide | Unsuitable for semiconductors (ionic contamination) |
| Parameter | Typical Range |
|---|---|
| Concentration | 2.38–5% |
| Temperature | 20–23°C |
| Development Time | 30–90 sec (spin process) |
| Rinse | DI water |
| Aspect | Details |
|---|---|
| Global Demand | ~50.000 tons/year (25% sol. basis) |
| Price (25% sol.) | $15–30/kg (Electronic Grade) |
| Major Suppliers | Tama Chemicals, Sachem, Fujifilm, TOK |
| Advantages | Limitations |
|---|---|
| Ultra-high purity for nodes <10nm | Highly toxic (requires strict handling) |
| Excellent photoresist selectivity | Decomposes at ~130°C |
| Low metal contamination | Expensive purification process |
TMAH is the industry-standard developer for advanced semiconductor and LCD manufacturing due to its ultra-high purity, controllable development rate, and compatibility with modern photoresists. Despite its toxicity, no equally effective alternative exists for sub-10nm processes. Future trends focus on closed-loop recycling and lower-concentration formulations to reduce costs and hazards.
Declaration: The products displayed on this website are intended exclusively for industrial applications or scientific research. They are not intended for medical, pharmaceutical, or food use. In accordance with applicable laws and regulations, purchasing organizations must hold valid qualifications and approvals.
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